Flexible display device which can be folded or rolled

ABSTRACT

A display device including a substrate having a display area to display an image and a non-display area, at least one pixel provided on the substrate, a first insulating layer provided on the substrate, and including a first opening at a area adjacent to the display area, a second insulating layer provided on the first insulating layer, and including a second opening at the area adjacent to the display area, and an encapsulation layer covering the first opening, the second opening, and a portion of the non-display area. The pixel includes a first electrode provided on the first insulating layer, and a second electrode provided on the second insulating layer. At least one of the first electrode and the second electrode includes a metal layer. At least one of sides of the first opening includes a plurality of slopes having different inclinations.

CROSS-REFERENCE TO RELATED APPLICATION

This application claims priority from and the benefit of Korean PatentApplication No. 10-2016-0150058, filed on Nov. 11, 2016, which is herebyincorporated by reference for all purposes as if fully set forth herein.

BACKGROUND Field

The invention relates generally to a display device, and, moreparticularly, to a display device capable of flexing, folding and/orrolling.

Discussion of the Background

Recently, flexible display devices having flat panel displays are beingdeveloped. Representative examples of a flat panel display may include aliquid crystal display (LCD), an organic light-emitting diode (OLED), anelectrophoretic display (EPD), and the like.

Bendable and flexible display devices may be folded and rolled.Consequently, the flexible display devices are able to include largerscreens while remaining portable. Such flexible display devices may beapplied in various fields including not only mobile devices such as amobile phone, a portable multimedia player (PMP), a navigation device,an ultra mobile PC (UMPC), an electronic book, and an electronicnewspaper, but also a TV, a monitor, and so forth.

The above information disclosed in this Background section is only forenhancement of understanding of the background of the inventiveconcepts, and, therefore, it may contain information that does not formthe prior art that is already known in this country to a person ofordinary skill in the art.

SUMMARY

Display devices constructed according to the principles of the inventionreduce or prevent defects in or damage to an encapsulation layer stackedon an insulating layer of the device. For example, the process ofetching a metal layer while manufacturing a display device can create avortex which, after the etchant is removed, results in the deposit ofsome of the etched metal in the location of an encapsulation layer ofthe device that has a relatively low elasticity. When the display deviceis subsequently pressed, e.g., during a subsequent step in the processof manufacturing the display device, force is applied to theencapsulation layer. This force can damage the encapsulation layerstacked on an insulating layer due to the presence of the depositedetched metal next to the encapsulation layer.

Additional aspects will be set forth in the detailed description whichfollows, and, in part, will be apparent from the disclosure, or may belearned by practice of the inventive concepts.

According to one aspect of the invention, a display device includes asubstrate including a display area to display an image, and anon-display area provided on at least one side of the display area, atleast one pixel provided on the substrate, a first insulating layerprovided on the substrate, and including a first opening at an areaadjacent to the display area, a second insulating layer provided on thefirst insulating layer, and including a second opening at the areaadjacent to the display area, and an encapsulation layer covering thefirst opening, the second opening, and a portion of the non-displayarea, wherein the pixel includes a first electrode provided on the firstinsulating layer and a second electrode provided on the secondinsulating layer, and at least one of the first electrode and the secondelectrode includes a metal layer, and wherein at least one of sides ofthe first opening comprises a plurality of slopes having differentinclinations.

The side of the first opening may include a first slope having a firstinclination, a second slope having a second inclination different fromthe first inclination, and a third slope having a third inclinationdifferent from the second inclination.

The second inclination may be greater than the first inclination or thethird inclination.

The second insulating layer may cover the first slope, the second slope,and the third slope.

The first opening and the second opening may extend along the boundarybetween the display area and the non-display area of the substrate.

The non-display area may include one side thereof a bent area havingflexibility.

The bent area may be bendable at a radius of curvature of about 4.5 mmor less.

The first insulating layer and the second insulating layer may beprovided in the bent area.

The non-display area may be provided along a perimeter of the displayarea.

The encapsulation layer may include a first inorganic insulating layer,an organic insulating layer, and a second inorganic insulating layerthat are successively stacked.

The first inorganic insulating layer and the second inorganic insulatinglayer may be provided over the first opening and the second opening.

Each of the first insulating layer and the second insulating layer mayinclude organic insulating material.

The substrate may have flexibility.

According to another aspect of the invention, a display device includesa substrate including a display area to display an image, and anon-display area provided on at least one side of the display area, atleast one pixel provided on the substrate, a first insulating layerprovided on the substrate, and including a first opening at an areaadjacent to the display area, a second insulating layer provided on thefirst insulating layer, and including a second opening at the areaadjacent to the display area, and an encapsulation layer covering thefirst opening, the second opening, and a portion of the non-displayarea, wherein the pixel comprises a first electrode provided on thefirst insulating layer, and a second electrode provided on the secondinsulating layer, and at least one of the first electrode and the secondelectrode includes a metal layer, and wherein the second insulatinglayer covers at least one side of the first opening.

At least one of sides of the first opening may include a plurality ofslopes having different inclinations.

The second insulating layer may cover a side of the first opening thatis adjacent to the display area.

The first insulating layer may have two parts with a distancetherebetween and a distance between an edge of the first insulatinglayer and an edge of the second insulating layer opposite to the edge ofthe first insulating layer may be less than the distance between the twoparts of the first insulating layer.

The distance between the two parts of the first insulating layer and thedistance between the first insulating layer and the second insulatinglayer may be within a range in which metal particles deposited on the atleast one of the sides of the first opening do not damage theencapsulating layer.

The first insulating layer may have two parts with a distancetherebetween and a distance between an edge of the first insulatinglayer and an edge of the second insulating layer opposite to the edge ofthe first insulating layer may be less than the distance between the twoparts of the first insulating layer.

The distance between the two parts of the first insulating layer and thedistance between the first insulating layer and the second insulatinglayer are within a range in which metal particles deposited on a side ofthe first opening do not damage the encapsulating layer.

The foregoing general description and the following detailed descriptionare exemplary and explanatory and are intended to provide furtherexplanation of the claimed subject matter.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings, which are included to provide a furtherunderstanding of the inventive concepts, and are incorporated in andconstitute a part of this specification, illustrate exemplaryembodiments of the inventive concepts, and, together with thedescription, serve to explain principles of the inventive concepts.

FIG. 1 is a perspective view of a display device constructed inaccordance with the principles of the invention;

FIG. 2 is a plan view of the display device of FIG. 1;

FIG. 3 is a cross-sectional view taken along line I-I′ of FIG. 2illustrates a boundary portion between the display area and anon-display area including a first opening in an insulating layer havingsloped sides;

FIG. 4 is an enlarged cross-sectional view of a portion of FIG. 3illustrating a first embodiment of the first opening in more detail;

FIG. 5 is an enlarged cross-sectional view of a portion of FIG. 3illustrating a second embodiment of the first opening; and

FIG. 6 is an enlarged cross-sectional view of a portion of FIG. 3illustrating a third embodiment of the first opening.

DETAILED DESCRIPTION OF THE ILLUSTRATED EMBODIMENTS

In the following description, for the purposes of explanation, numerousspecific details are set forth in order to provide a thoroughunderstanding of various exemplary embodiments. It is apparent, however,that various exemplary embodiments may be practiced without thesespecific details or with one or more equivalent arrangements. In otherinstances, well-known structures and devices are shown in block diagramform in order to avoid unnecessarily obscuring various exemplaryembodiments.

In the accompanying figures, the size and relative sizes of layers,films, panels, regions, etc., may be exaggerated for clarity anddescriptive purposes. Also, like reference numerals denote likeelements.

When an element or layer is referred to as being “on,” “connected to,”or “coupled to” another element or layer, it may be directly on,connected to, or coupled to the other element or layer or interveningelements or layers may be present. When, however, an element or layer isreferred to as being “directly on,” “directly connected to,” or“directly coupled to” another element or layer, there are no interveningelements or layers present. For the purposes of this disclosure, “atleast one of X, Y, and Z” and “at least one selected from the groupconsisting of X, Y, and Z” may be construed as X only, Y only, Z only,or any combination of two or more of X, Y, and Z, such as, for instance,XYZ, XYY, YZ, and ZZ. Like numbers refer to like elements throughout. Asused herein, the term “and/or” includes any and all combinations of oneor more of the associated listed items.

Although the terms first, second, etc. may be used herein to describevarious elements, components, regions, layers, and/or sections, theseelements, components, regions, layers, and/or sections should not belimited by these terms. These terms are used to distinguish one element,component, region, layer, and/or section from another element,component, region, layer, and/or section. Thus, a first element,component, region, layer, and/or section discussed below could be termeda second element, component, region, layer, and/or section withoutdeparting from the teachings of the present disclosure.

Spatially relative terms, such as “beneath,” “below,” “lower,” “above,”“upper,” and the like, may be used herein for descriptive purposes, and,thereby, to describe one element or feature's relationship to anotherelement(s) or feature(s) as illustrated in the drawings. Spatiallyrelative terms are intended to encompass different orientations of anapparatus in use, operation, and/or manufacture in addition to theorientation depicted in the drawings. For example, if the apparatus inthe drawings is turned over, elements described as “below” or “beneath”other elements or features would then be oriented “above” the otherelements or features. Thus, the exemplary term “below” can encompassboth an orientation of above and below. Furthermore, the apparatus maybe otherwise oriented (e.g., rotated 90 degrees or at otherorientations), and, as such, the spatially relative descriptors usedherein interpreted accordingly.

The terminology used herein is for the purpose of describing particularembodiments and is not intended to be limiting. As used herein, thesingular forms, “a,” “an,” and “the” are intended to include the pluralforms as well, unless the context clearly indicates otherwise. Moreover,the terms “comprises,” “comprising,” “includes,” and/or “including,”when used in this specification, specify the presence of statedfeatures, integers, steps, operations, elements, components, and/orgroups thereof, but do not preclude the presence or addition of one ormore other features, integers, steps, operations, elements, components,and/or groups thereof.

Various exemplary embodiments are described herein with reference tosectional illustrations that are schematic illustrations of idealizedexemplary embodiments and/or intermediate structures. As such,variations from the shapes of the illustrations as a result, forexample, of manufacturing techniques and/or tolerances, are to beexpected. Thus, exemplary embodiments disclosed herein should not beconstrued as limited to the particular illustrated shapes of regions,but are to include deviations in shapes that result from, for instance,manufacturing. For example, an implanted region illustrated as arectangle will, typically, have rounded or curved features and/or agradient of implant concentration at its edges rather than a binarychange from implanted to non-implanted region. Likewise, a buried regionformed by implantation may result in some implantation in the regionbetween the buried region and the surface through which the implantationtakes place. Thus, the regions illustrated in the drawings are schematicin nature and their shapes are not intended to illustrate the actualshape of a region of a device and are not intended to be limiting.

Unless otherwise defined, all terms (including technical and scientificterms) used herein have the same meaning as commonly understood by oneof ordinary skill in the art to which this disclosure is a part. Terms,such as those defined in commonly used dictionaries, should beinterpreted as having a meaning that is consistent with their meaning inthe context of the relevant art and will not be interpreted in anidealized or overly formal sense, unless expressly so defined herein.

Referring to FIGS. 1 and 2, the display device includes a substrate SUB,pixels PXL provided on the substrate SUB, and a line part LP coupledwith the pixels PXL.

The substrate SUB includes a display area DA, and a non-display area NDAprovided on at least one side of the display area DA.

The substrate SUB may have an approximately quadrangular shape,particularly, a rectangular shape. The substrate SUB may include a pairof short sides which are parallel to a first direction DR1, and a pairof long sides which are parallel to a second direction DR2. In theillustrated embodiment, the four sides of the substrate SUB may bereferred to in sequence as first side S1 to fourth side S4, with thefirst and third sides being the short sides and second and fourth sidesbeing the long sides.

However, the shape of the substrate SUB is not limited to such arectangular shape, but may have various shapes. For example, thesubstrate SUB may be provided in shapes such as a closed polygonincluding linear sides, a circle, an ellipse or the like including aside formed of a curved line, and a semicircle, a semi-ellipse or someother shape including sides formed of a straight line and a curved line,and so forth. When the substrate SUB has a side formed of a straightline, at least some of corners of each shape may be formed of a curvedline. For instance, when the substrate SUB has a rectangular shape, eachof the junctions between adjacent linear sides is replaced with a curvedline having a predetermined curvature. That is, each of the vertices ofthe rectangular substrate SUB may be formed of a curved side, which hasa predetermined curvature, and opposite ends of which are respectivelycoupled to two adjacent linear lines. The curvature may vary dependingon the position. For example, the curvature may vary depending on astart point of the curved line, the length of the curved line, and soon.

The display area DA is an area which is provided with a plurality ofpixels PXL, and on which an image is displayed. The display area DA maybe provided with a shape corresponding to the shape of the substrateSUB. For example, in the same manner as the shape of the substrate SUB,the display area DA may be provided in various shapes such as a closedpolygon including linear sides, a circle, an ellipse or the likeincluding a side formed of a curved line, and a semicircle, asemi-ellipse or the like including sides formed of a straight line and acurved line, and so forth. When the display area DA has a side formed ofa straight line, at least some of the corners of each shape may beformed of a curved line.

The pixels PXL are provided on the display area DA of the substrate SUB.Each pixel PXL refers to the smallest unit displaying an image, and aplurality of pixels may be provided. The pixels PXL may emit white lightand/or colored light. Each pixel PXL may emit any one color of red,green and blue, but it is not limited to this structure, and the pixelPXL may emit a color such as cyan, magenta, or yellow.

Each of the pixels PXL may be a light-emitting element including anorganic emission layer, but it is not limited to this structure, but thepixel PXL may be embodied in various forms such as a liquid crystalelement, an electrophoretic element, and an electrowetting element.

The non-display area NDA may further include an additional area ADAwhich protrudes from a portion thereof. The additional area ADA mayprotrude from the sides that define the non-display area NDA. As shown,the additional area ADA protrudes from a side corresponding to one ofthe short sides of the substrate SUB. However, the additional area ADAmay protrude from one of the long sides or be provided in the form inwhich it protrudes from each of two or more sides. A data drive unit maybe provided on or coupled to the additional area ADA, but it is notlimited to this structure, and various components may be disposed on theadditional area ADA.

At least portion of the display device may have flexibility, and thedisplay device may be folded at any flexible portion thereof. That is,the display device may include a bent area BA which has flexibility andis folded in one direction, and a flat area FA which extends beyond atleast one side of the bent area BA and is flat without folding. The flatarea FA may have flexibility or might not.

As shown, the bent area BA is provided in the additional area ADA. Theremay be provided a first flat area FA1 and a second flat area FA2 thatare spaced apart from each other with the bent area BA interposedtherebetween. The first flat area FA1 may include the display area DA.The bent area BA may be spaced apart from the display area DA.

With regard to the bent area BA, a line about which the display deviceis folded refers to a folding line, and the folding line is provided inthe bent area BA. In this regard, the term “fold” means that the displaydevice may be changed from the original shape thereof to another shapewithout being fixed in shape, and has various meanings including being“folded” or “curved” along the folding line, or being “rolled” in ascrolling manner or otherwise flexed. Therefore, the two flat areas FA1and FA2 are disposed such that one side of one flat area may be parallelwith one side of the other flat area, and the display device is foldedsuch that the flat areas FA1 and FA2 face each other. However, the twoflat areas FA1 and FA2 with the bent area BA interposed therebetween maybe folded onto each other with a predetermined angle therebetween (e.g.,an acute angle, right angle or obtuse angle), or in some otherorientation.

The additional area ADA may be bent later along the folding line. Inthis case, since the additional area ADA is bent, the width of a bezelmay be reduced.

Referring to FIG. 3, the display area DA will be first described, andthen the non-display area NDA will be described.

A plurality of pixels PXL are provided in the display area DA. Eachpixel PXL includes a transistor that is coupled to a corresponding lineof the line part LP, a light emitting element that is coupled to thetransistor, and a capacitor Cst. The transistor may include orconstitute a drive transistor for controlling the light emittingelement, and a switching transistor for switching the drive transistor.

The pixels PXL are provided on the substrate SUB.

The substrate SUB may be made of insulating material such as glass orresin. Furthermore, the substrate SUB may be made of material havingflexibility so as to be bendable or foldable. Consequently, not only thebent area BA provided on the non-display area NDA of the substrate SUBbut also the other areas of the substrate SUB may also be bendable orfoldable. For example, the display area DA on which the pixels PXL areprovided may be flexed, bent or folded. Furthermore, the substrate SUBmay have a single layer or multilayer structure.

For example, the substrate SUB may include at least one of thefollowing: polystyrene, polyvinyl alcohol, polymethyl methacrylate,polyethersulfone, polyacrylate, polyetherimide, polyethylenenaphthalate, polyethylene terephthalate, polyphenylene sulfide,polyarylate, polyimide, polycarbonate, triacetate cellulose, andcellulose acetate propionate. However, the material constituting thesubstrate SUB may be changed in various ways, and the substrate SUB mayalso be made of fiber reinforce plastic (FRP) or the like.

A buffer layer BF is formed on the substrate SUB. The buffer layer BFfunctions to prevent impurities from diffusing into the switchingtransistor or the drive transistor. The buffer layer BF may be providedin a single layer structure or a multilayer structure having at leasttwo or more layers.

The buffer layer BF may be an inorganic insulating layer formed ofinorganic material. For example, the buffer layer BF may be formed ofsilicon nitride, silicon oxide, silicon oxynitride, or the like. In thecase where the buffer layer BF has a multilayer structure, therespective layers may be formed of the same material or differentmaterials. The buffer layer BF may be omitted depending on the materialof the substrate SUB or processing conditions.

Active patterns ACT are provided on the buffer layer BF. Each activepattern ACT is formed of a semiconductor material. Each active patternACT may include a source region, a drain region, and a channel regionprovided between the source region and the drain region. The activepattern ACT may be a semiconductor pattern formed of polysilicon,amorphous silicon, an oxide semiconductor, or some other material. Thechannel region may be a semiconductor pattern undoped with impuritiesand an intrinsic semiconductor. Each of the source region and the drainregion may be a semiconductor pattern doped with an impurity. Animpurity such as an n-type impurity, a p-type impurity or other metalsmay be used as the doping impurity.

A first passivation layer PSV1 is provided on the active pattern ACT.The first passivation layer PSV1 may be an inorganic insulating layerformed of inorganic material, or an organic insulating layer formed oforganic material. Inorganic insulating materials such as polysiloxane,silicon nitride, silicon oxide, or silicon oxynitride may be used as theinorganic insulating material. The organic insulating material may be amaterial such as a polyacryl-based compound, a polyimide-based compound,a fluorocarbon compound such as Teflon, or a benzocyclobutene compound.

A gate electrode GE and a lower capacitor electrode LE are provided onthe first passivation layer PSV1. The gate electrode GE is formed tocover a region corresponding to the channel region of the active patternACT.

The gate electrode GE and the lower capacitor electrode LE may be madeof metal. For example, the gate electrode GE may be made of at least oneof metals such as gold (Au), silver (Ag), aluminum (Al), molybdenum(Mo), chrome (Cr), titanium (Ti), nickel (Ni), neodymium (Nd), copper(Cu), or an alloy of these metals. The gate electrode GE may have asingle layer structure, but it is not limited to this structure, and mayhave a multilayer structure formed by stacking two or more materials ofmetals and alloys.

Other lines including gate lines may be provided in the same layer asthat of the gate electrode GE and the lower capacitor electrode LE andformed of the same material as these electrodes. Other lines such as thegate lines may be directly or indirectly coupled to a portion of thetransistor, e.g., the gate electrode GE, in each pixel PXL.

A second passivation layer PSV2 is provided on the gate electrode GE andthe lower capacitor electrode LE. The second passivation layer PSV2 maybe an inorganic insulating layer formed of an inorganic material.Polysiloxane, silicon nitride, silicon oxide, silicon oxynitride, or thelike may be used as the inorganic material.

An upper capacitor electrode UE is provided on the second passivationlayer PSV2. The upper capacitor electrode UE may be formed of metal. Forexample, the upper capacitor electrode UE may be made of at least one ofmetals such as gold (Au), silver (Ag), aluminum (Al), molybdenum (Mo),chrome (Cr), titanium (Ti), nickel (Ni), neodymium (Nd), copper (Cu), oran alloy of these metals. The upper capacitor electrode UE may have asingle layer structure, but it is not limited to this structure, and itmay have a multilayer structure formed by stacking two or more materialsof the metals and alloys.

The lower capacitor electrode LE and the upper capacitor electrode UEare provided with the second passivation layer PSV2 therebetween, thusforming the capacitor Cst. The capacitor Cst may be formed of the lowercapacitor electrode LE and the upper capacitor electrode UE, but thecapacitor Cst is not limited to this orientation. The capacitor Cst maybe embodied in various other manners.

A third passivation layer PSV3 is provided on the upper capacitorelectrode UE. The third passivation layer PSV3 may be an inorganicinsulating layer formed of an inorganic material. Polysiloxane, siliconnitride, silicon oxide, silicon oxynitride, or the like may be used asthe inorganic material.

A source electrode SE and a drain electrode DE are provided on the thirdpassivation layer PSV3. The source electrode SE and the drain electrodeDE respectively come into contact with the source region and the drainregion of the active pattern ACT through contact holes that are formedin the third passivation layer PSV3, the second passivation layer PSV2and the first passivation layer PSV1.

The source electrode SE and the drain electrode DE may be made of metal.For example, each of the source electrode SE and the drain electrode DEmay be made of at least one of metals such as gold (Au), silver (Ag),aluminum (Al), molybdenum (Mo), chrome (Cr), titanium (Ti), nickel (Ni),neodymium (Nd), copper (Cu), or an alloy of these metals. Each of thesource electrode SE and the drain electrode DE may have a single layerstructure, but they are not limited to this structure, and they may havea multilayer structure formed by stacking two or more materials ofmetals and alloys.

Data lines DL or first power lines may be provided in the same layer asthat of the source electrode SE and the drain electrode DE and formed ofthe same material as them. The data lines DL or the first power linesmay be directly or indirectly coupled to a portion, e.g., the sourceelectrode SE and/or the drain electrode DE, of the transistor in eachpixel PXL.

A fourth passivation layer PSV4 may be provided on the source electrodeSE and the drain electrode DE. The fourth passivation layer PSV4 may bean inorganic insulating layer formed of an inorganic material.Polysiloxane, silicon nitride, silicon oxide, silicon oxynitride, or thelike may be used as the inorganic material. The fourth passivation layerPSV4 may be omitted.

A first insulating layer INS1 may be provided on the fourth passivationlayer PSV4. In the case where the fourth passivation layer PSV4 isomitted, the first insulating layer INS1 may be provided on the thirdpassivation layer PSV3.

At least one pixel PXL is provided on the substrate SUB. Each pixel mayhave a first electrode EL1 provided between the first insulating layerINS1 and a second insulating layer INS2, and a second electrode EL2provided on the second insulating layer INS2. A metal layer may beprovided in at least one of the first electrode EL1 and the secondelectrode EL2. The first electrode EL1 and the second electrode EL2 maybe an anode and a cathode, respectively.

The first electrode EL1 may be formed of a metal layer made of Ag, Mg,Al, Pt, Pd, Au, Ni, Nd, Ir, Cr, or an alloy of these metals, and/or ITO(indium tin oxide), IZO (indium zinc oxide), ZnO (zinc oxide), ITZO(indium tin zinc oxide), or the like.

The first electrode EL1 may be formed of one kind of metal, but it isnot limited to this structure, and it may be formed of two or more kindsof metals, for example, as an alloy of Ag and Mg.

The first electrode EL1 may be formed of a transparent conductive layerwhen desired to provide an image in a direction toward a lower portionof the substrate SUB, or may be formed of a metal reflective layerand/or a transparent conductive layer when desired to provide an imagein a direction toward an upper portion of the substrate SUB.

The second insulating layer INS2 for defining a pixel (PXL) regioncorresponding to each pixel PXL is provided on the substrate SUB onwhich the first electrode EL1, etc. are formed. The second insulatinglayer INS2 may be an organic insulating layer made of an organicmaterial. An organic insulating material such as a polyacryl-basedcompound, a polyimide-based compound, a fluorocarbon compound such asTeflon, or a benzocyclobutene compound may be used as the organicmaterial.

The second insulating layer INS2 exposes an upper surface of the firstelectrode EL1 and protrudes from the substrate SUB along the peripheryof the pixel PXL.

The first insulating layer INS1 and the second insulating layer INS2 aresuccessively stacked on the substrate SUB. Each of the first insulatinglayer INS1 and the second insulating layer INS2 may be an organicinsulating layer made of organic material. In FIG. 3, the display devicehas only two insulating layers. However, the display device may furtherhave an insulating layer disposed between the first insulating layerINS1 and the second insulating layer INS2, under the first insulatinglayer, and/or on the second insulating layer INS2.

Still referring to FIG. 3, the first insulating layer INS1 has a firstopening OPN1, and the second insulating layer INS2 has a second openingOPN2. The first opening OPN1 and the second opening OPN2 may be providedat an area adjacent to the display area. The above area where the firstopening OPN1 and the second opening OPN2 may be provided at can be aboundary between the display area DA and the non-display area NDA.Therefore, the first insulating layer INS1 and the second insulatinglayer INS2 might not be provided at the boundary between the displayarea DA and the non-display area NDA. Due to the presence of the firstand second openings OPN1 and OPN2, there might be no organic insulatinglayer at the boundary between the display area DA and the non-displayarea NDA. The organic insulating layer may be a path along whichexternal oxygen or water penetrates the display device. In theillustrated embodiment of FIG. 3, there is no organic insulating layerin the first and second openings OPN1 and OPN2. An encapsulation layeris stacked on the first and second openings OPN1 and OPN2. As a result,external oxygen or water may be prevented from penetrating the displaydevice through the organic insulating layer. Each of the first openingOPN1 and the second opening OPN2 may have a sufficiently large width sothat residual material does not remain in the opening during the processof forming the first insulating layer INS1 or the second insulatinglayer INS2.

One side of the first opening OPN1 may include a plurality of slopes SLPhaving different inclinations. The slopes SLP may be formed on the sideof the first opening OPN1 that is adjacent to, at or in the displayarea. Referring to FIG. 3, the slopes SLP include a first slope SLP1, asecond slope SLP2 and a third slope SLP3.

The display device may include the slopes SLP on at least one of sidesof the first opening OPN1 so as to prevent metal particles from beingdeposited on one side of the first opening OPN1.

The metal layer included in the first electrode EL1 or the secondelectrode EL2 is etched by an etchant during the process of forming thefirst electrode EL1 or the second electrode EL2. The etched metal ispresent in the etchant in the form of metal ions. When the metal ions inthe etchant come into contact with another metal, the metal ions mayreceive electrons and be extracted from the etchant. The extraction ofmetal depends on the ionization tendency of metal. For example, a firstmetal (M1) included in the first electrode EL1 or the second electrodeEL2 may be present in the form of first metal ions (M1⁺) by etching.When the first metal ions (M1⁺) in an etchant come into contact with asecond metal (M2), the first metal ions (M1⁺) may be extracted in theform of first metal (M1), and the second metal (M2) may be ionized inthe form of second metal ions (M2⁺), as shown in the following chemicalformula.aM1^(c+) +bM2→aM1(↓)+bM2^(d+)  [Chemical Formula 1](a, b, c, d are arbitrary natural numbers)

In the above-described case, the ionization tendency of the second metal(M2) is greater than that of the first metal (M1). After extraction,when the first metal (M1) floating in the etchant is deposited on acertain region in the display device, a problem may be caused by thefirst metal (M1). For example, in the case where particles of the firstmetal (M1) are deposited on one side of the first opening OPN1, thedeposited particles of the first metal (M1) may damage an encapsulationlayer SL formed on the first insulating layer INS1. In detail, particlesof the first metal (M1) that are deposited on one side of the firstopening OPN1 may damage encapsulation layers SL1 and SL3 each havingrelatively low elasticity, when the display device is pressed during theprocess of manufacturing the display device.

Particles of the first metal (M1) which may cause such a problem may bedeposited on one side of the first opening OPN1, in particular, on aside thereof adjacent to the bent area BA. In the case where the firstinsulating layer INS1 has a stepped portion with a steep slope on a sideof the first opening OPN1, a vortex of etchant may be generated on adistal end of the first insulating layer INS1 or one side of the firstopening OPN1. Particles of the first metal (M1) floating in the etchantmay accumulate in a region where the vortex is generated. The particlesof the first metal (M1) may be deposited on the region where the vortexis generated, after the etchant has been removed.

According to the principles of the invention, particles of the firstmetal (M1) may be prevented from being deposited on a side of the firstopening OPN1. In detail, because the slopes SLP are included in at leastone of the sides of the first opening OPN1, a vortex of etchant isprevented from being formed on a side of the first opening OPN1.Consequently, the particles of the first metal (M1) floating in theetchant are not deposited on a side of the first opening OPN1 and,moreover, subsequent damage to the encapsulation layer SL formed on thefirst opening OPN1 does not occur, e.g., during the subsequent step(s)of pressing that transmit force to the encapsulation layer SL.

The first metal may be, for example, silver (Ag). Therefore, silver (Ag)particles may be prevented from being deposited on one side of the firstopening OPN1. Silver (Ag) may be included in the display device. Sincesilver (Ag) is material having high electrical conductivity, the silver(Ag) may be used as material of electrodes or power lines in the displaydevice. Silver (Ag) included in electrodes or power lines may be meltedinto an etchant in the form of silver ions (Ag⁺) during an etchingprocess. Such silver ions (Ag⁺) may receive electrons and be extractedto form silver (Ag) again during the process of manufacturing thedisplay device. For example, when the etchant including silver ions(Ag⁺) comes into contact with aluminum (Al), electrons may move from thealuminum (Al) to the silver ions (Ag⁺), whereby silver (Ag) may beextracted. During the process of manufacturing the display device, it isdifficult to avoid the etchant including silver ions (Ag⁺) from cominginto contact with another metal. Therefore, in many cases, the silverions (Ag⁺) and the resulting extracted silver (Ag) are present in theetchant.

The first insulating layer INS1 and the second insulating layer INS2 maybe successively stacked and form a dam. The first opening OPN1 and thesecond opening OPN2 may be formed between the bent area BA and the dam.Therefore, the slopes SLP may be provided on a side of the firstinsulating layer INS1 stacked on the bent area BA, or on a side of thefirst insulating layer INS1 forming the dam. However, the positions ofthe first insulating layer INS1, the first opening OPN1 and the slopesSLP are not limited to these configurations. For example, the firstopening OPN1 may be provided between a region in which the dam isprovided and a region in which the first electrode EL1 is provided.Alternatively, in the case where a dam is not provided in the displaydevice, the first opening OPN1 may be provided between the bent area BAand the region in which the first electrode EL1 is provided. Dependingon the position in which the first opening OPN1 is provided, thepositions at which the slopes SLP are provided may also be changed.

An organic light-emitting layer OL may be provided on the pixel (PXL)region enclosed by the second insulating layer INS2.

The organic light-emitting layer OL may include low-molecular orhigh-molecular material. The low-molecular material may include copperphthalocyanine (CuPc), N,N′-Di(naphthalene-1-yl)-N,N′-diphenyl-benzidine(NPB), tris-8-hydroxyquinoline aluminum (Alq3), etc. Such materials maybe formed by a vacuum evaporation method. The high-molecular materialmay include PEDOT, PPV (poly-phenylenevinylene)-based material,polyfluorene-based material, or some other material.

The organic light-emitting layer OL may have a single-layer structure,or a multilayer structure including various functional layers. When theorganic light-emitting layer OL has a multilayer structure, it may havea structure in which a hole injection layer, a hole transport layer, anemission layer, an electron transport layer, an electron injectionlayer, and so on, are stacked in a single-material or multi-materialstructure. The organic light-emitting layer OL may be formed by anevaporation method, a screen printing method, an inkjet printing method,a laser induced thermal imaging (LITI) method, or the like.

The structure of the organic light-emitting layer OL is not limited tothe foregoing, and it may have various other structures. At least aportion of the organic light-emitting layer OL may be integrally formedover a plurality of first electrodes EL1. Alternatively, the organiclight-emitting layer OL may be individually provided corresponding toeach of the plurality of first electrodes EL1.

The second electrode EL2 is provided on the organic light-emitting layerOL. The second electrode EL2 may be provided for each pixel PXL.Alternatively, the second electrode EL2 may be provided to cover most ofthe display area DA and be shared by the plurality of pixels PXL.

The second electrode EL2 may be used as either an anode or a cathode.When the first electrode EL1 is an anode, the second electrode EL2 maybe used as a cathode. When the first electrode EL1 is a cathode, thesecond electrode EL2 may be used as an anode.

The second electrode EL2 may be formed of a metal layer, made of Ag, Mg,Al, Pt, Pd, Au, Ni, Nd, Jr, Cr, or the like, and/or a transparentconductive layer made of ITO (indium tin oxide), IZO (indium zincoxide), ZnO (zinc oxide), ITZO (indium tin zinc oxide), or the like. Thesecond electrode EL2 may be formed of a multilayer structure having twoor more layers including a thin metal layer. For example, the secondelectrode EL2 may be formed of a triple-layer structure comprisingITO/Ag/ITO.

The second electrode EL2 may be formed of a metal reflective layerand/or a transparent conductive layer when it is desired to provide animage in a direction toward the lower portion of the substrate SUB, andmay be formed of a transparent conductive layer when it is desired toprovide an image in a direction toward the upper portion of thesubstrate SUB.

The encapsulation layer SL is provided on the second electrode EL2. Theencapsulation layer SL may be formed of a single layer or multiplelayers. The encapsulation layer SL may include first to thirdencapsulation layers SL1 to SL3. The first to third encapsulation layersSL1 to SL3 may be made of an organic material and/or an inorganicmaterial. Disposed at the outermost position, the third encapsulationlayer SL3 may be made of an inorganic material.

Hereinbelow, the non-display area NDA will be described. In thefollowing description of the non-display area NDA, explanation of thesame elements as that mentioned above will be omitted or simplified toavoid redundancy of explanation.

The line part LP is provided in the non-display area NDA. Thenon-display area NDA has therein the bent area BA at which the substrateSUB is bent.

The line part LP includes the data lines DL and couples the drive unitand the pixels PXL.

The data lines DL may couple the pixels PXL and the drive unit. Toachieve this, the data lines DL may extend from the pixels PXL generallyin the second direction DR2. The data lines DL may extend to an end ofthe additional area ADA with respect to the second direction DR2.Contact electrodes CTE may be provided on ends of the data lines DL. Thepixels PXL may be coupled, through the contact electrodes CTE, to thedrive unit that is embodied in a chip-on-film form or the like.

The data lines DL may include a plurality of sub-lines coupled to eachother. FIG. 3 is simplified for clarity in that only a fan-out line DLb,a link line DLc and a coupling line DLd of the data lines DL areillustrated.

The buffer layer BF is provided on the non-display area NDA of thesubstrate SUB.

The first to fourth passivation layers PSV1 to PSV4 are successivelyprovided on the buffer layer BF.

A third opening OPN3 is formed in the insulating layers provided in thebent area BA. The bent area BA is an area at which the substrate SUB isbent. In other words, the third opening OPN3 may be formed in the bufferlayer BF, the first passivation layer PSV1, the second passivation layerPSV2 and the third passivation layer PSV3 by removing portions thereofcorresponding to the bent area BA. In some of the buffer layer BF, thefirst passivation layer PSV1, the second passivation layer PSV2 and thethird passivation layer PSV3, portions thereof corresponding to the bentarea BA might not be removed. For example, in the buffer layer BF, aportion thereof corresponding to the bent area BA might not be removed,and the other insulating layers, that is, the first passivation layerPSV1, the second passivation layer PSV2 and the third passivation layerPSV3, may be formed such that portions thereof corresponding to the bentarea BA are removed to form the third opening OPN3.

The phrase “the third opening OPN3 corresponds to the bent area BA” mayrefer to the third opening OPN3 overlapping the bent area BA. The areaof the opening OPN may be greater than that of the bent area BA. Thewidth of the third opening OPN3 is illustrated as being larger than thatof the bent area BA. However, the width of the third opening OPN3 may bethe same as that of the bent area BA or otherwise different from theillustrated width.

For reference, although, in FIG. 3, inner side surfaces of the bufferlayer BF, the first passivation layer PSV1, the second passivation layerPSV2, and the third passivation layer PSV3 have been illustrated asbeing aligned with each other and disposed on a linear line, they mayhave other configurations. For example, the third opening OPN3 of thethird passivation layer PSV3 may have an area greater than that of thethird opening OPN3 of the buffer layer BF. The third opening OPN3 of thebuffer BF may be defined as having the smallest area among the thirdopening OPN3 of the first passivation layer PSV1, the third opening OPN3of the second passivation layer PSV2, and the third opening OPN3 of thethird passivation layer PSV3.

A bent-part insulating layer INS_B is provided in the third openingOPN3. At least a portion of the third opening OPN3 is filled with thebent-part insulating layer INS_B. In FIG. 3 there is illustrated anexample in which the third opening OPN3 is completely filled with thebent-part insulating layer INS_B. The bent-part insulating layer INS_Bmay fill the third opening OPN3 and, simultaneously, cover a portion ofan upper surface of the third passivation layer PSV3 corresponding to anarea adjacent to the third opening OPN3, e.g., the first and/or secondflat areas FA1 and FA2.

The bent-part insulating layer INS_B may be an organic insulating layermade of an organic material. An organic insulating material such as apolyacryl-based compound, a polyimide-based compound, a fluorocarboncompound such as Teflon, or a benzocyclobutene compound may be used asthe organic material.

Although FIG. 3 depicts the display device in an unbent state, thedisplay device may be bent in the bent area BA. The display device maybe manufactured in a flat shape and then bent later.

The bent area BA has been illustrated as being disposed within a portionfrom which the inorganic insulating layers have been removed. However,the bent area BA may match the portion from which the inorganicinsulating layers have been removed. For example, although the bent areaBA generally corresponds to the portion from which the inorganicinsulating layers have been removed, the bent area BA may be equal to,or wider, or narrower, than the portion from which the inorganicinsulating layers have been removed. Furthermore, the bent area BA hasbeen illustrated as being disposed on only the non-display area NDA, butmay have other configurations. For example, the bent area BA may beprovided over both the non-display area NDA and the display area DA, ormay be disposed in the display area DA. The fourth passivation layerPSV4 may be provided on the substrate SUB. The fourth passivation layerPSV4 may be an inorganic insulating layer. In this regard, the fourthpassivation layer PSV4 is not formed in a region corresponding to thebent area BA, in the same manner as that of the above-mentionedinorganic insulating layers (the buffer layer BF, the first passivationlayer PSV1, the second passivation layer PSV2, and/or the thirdpassivation layer PSV3). In addition, the fourth passivation layer PSV4exposes a portion of an upper surface of a lower contact electrode CTEa.

The lower contact electrode CTEa may be provided on the thirdpassivation layer PSV3. An upper contact electrode CTEb may be providedon the lower contact electrode CTEa. The upper contact electrode CTEbmay be formed using the same material as that of a connection patternCNP of the display area DA through the same process. The lower contactelectrode CTEa and the upper contact electrode CTEb constitute thecontact electrodes CTE. The lines may be coupled, through the contactelectrodes CTE, to the drive unit that is embodied in a chip-on-film orflexible printed circuit board form, or the like.

To more clearly illustrate the shape of the first insulating layer andthe second insulating layer and the openings formed therein, someelements are not shown in FIG. 4. The display device is not limited tothe configuration shown in FIG. 4. Therefore, the display device mayfurther include other elements in addition to the elements shown in FIG.4.

Referring to FIG. 4, the first insulating layer INS1, the secondinsulating layer INS2 and the encapsulation layer SL are successivelystacked on the substrate SUB.

With regard to the slopes SLP for preventing a vortex of etchant, thefirst slope SLP1 may have a first inclination, and the second slope SLP2may have a second inclination different from the first inclination. Inaddition, the third slope SLP3 may have a third inclination differentfrom the second inclination. The first inclination and the thirdinclination may be same or differ from each other. The secondinclination may have an angle greater than that of the first inclinationor the third inclination. When the first inclination and the thirdinclination satisfies any of the foregoing relationships, silver (Ag)particles may be reduced or prevented from being deposited on one sideof the first opening OPN1.

The number of different slopes SLP and the inclination of each slope SLPis not limited to the above-described example. Therefore, the slopes SLPmay include two, four or more slopes as well as the three slopes in theexamples described above. The inclinations of the slopes SLP may be alldifferent, or some of them may be the same. In addition, the slopes SLPmay be provided on one of opposite sides of the first opening OPN1, oron both sides thereof. Therefore, the slopes SLP may be provided on aside of the first opening OPN1 that is adjacent to the non-display areaNDA, or on both sides of the first opening OPN1. Those skilled in theart may understand that various changes in the number, inclinations andpositions of slopes SLP are possible so long as the effects ofpreventing a vortex of etchant and preventing silver (Ag) particles frombeing deposited can be achieved.

The slopes SLP may be formed by controlling an etching rate. Forexample, the respective slopes SLP1, SLP2 and SLP3 illustrated in FIG. 4may be formed using a difference in etching rate between correspondingportions of the first insulating layer INS1. To vary the etching rate, ahalf-tone mask may be used or a plurality of masks may be used. Themethod of varying the etching rate to achieve the variable slopes SLP isnot limited to the above description, but may also include any othermethod known in the art to produce variable sloped surfaces.

The second insulating layer INS2 is provided on the first insulatinglayer INS1. Referring to FIG. 4, the second insulating layer INS2 coversonly a portion of the third slope SLP3. However, the second insulatinglayer INS2 may cover all of the slopes SLP as will be described below.

The encapsulation layer SL is provided on the second insulating layerINS2. The encapsulation layer SL may include a first encapsulation layerSL1, a second encapsulation layer SL2, and a third encapsulation layerSL3. The first encapsulation layer SL1 and the third encapsulation layerSL3 may be respectively a first inorganic insulating layer and a secondinorganic insulating layer. The second encapsulation layer SL2 may be anorganic insulating layer. Consequently, the encapsulation layer SL mayhave a structure in which the first inorganic insulating layer, theorganic insulating layer, and the second inorganic insulating layer aresuccessively stacked. However, the structure of the encapsulation layerSL may be something else as well. Therefore, those skilled in the artmay understand that the number or materials of encapsulation layers SLmay vary or be adjusted as desired by the skilled artisan.

The first encapsulation layer SL1 may be made of an inorganic material,the second encapsulation layer SL2 may be made of an organic material oran inorganic material, and the third encapsulation layer SL3 may be madeof an inorganic material. In the case of an inorganic material, theresistance to penetration of water or oxygen is higher than that of anorganic material, but the inorganic material is prone to crack becauseit has lower flexibility than an organic material. Since the firstencapsulation layer SL1 and the third encapsulation layer SL3 are madeof an inorganic material, and the second encapsulation layer SL2 is madeof an organic material, the spread of cracks may be reduced orprevented. In the case where the second encapsulation layer SL2 is madeof organic material, it may be fully covered with the thirdencapsulation layer SL3 so that an edge of the second encapsulationlayer SL2 is prevented from being exposed to the outside.

Organic insulating material such as a polyacryl-based compound, apolyimide-based compound, a fluorocarbon compound such as Teflon, or abenzocyclobutene compound may be used as the organic material.Polysiloxane, silicon nitride, silicon oxide, silicon oxynitride, or thelike may be used as the inorganic material. In the case where the secondencapsulation layer SL2 is made of an inorganic material in lieu of anorganic material, various silicon-based insulating materials, forexample, hexamethyldisiloxane (HMDSO), octamethylcyclotetrasiloxane(OMCTSO), tetramethyldisiloxane (TMDSO), tetraethyleorthosilicate(TEOS), and so on, may be used. The encapsulation layer SL may cover andprotect organic light-emitting layers that are prone to damage by wateror oxygen. The encapsulation layer SL may cover the display area DA andextend beyond the display area DA.

However, in the case of the insulating layers made of an organicmaterial, there are advantages in aspects of flexibility, elasticity,and so on, but they are prone to penetration of water or oxygen comparedto that of the insulation layer made of inorganic material. To preventwater or oxygen from penetrating into the insulating layers made of anorganic material, the insulating layers made of an organic material maybe covered with the insulating layers made of an inorganic material suchthat edges of the insulating layers made of organic material are notexposed to the outside. For example, the first insulating layer INS1 andthe second insulating layer INS2 that are made of the organic materialmay extend to only a boundary between the display area DA and thenon-display area NDA, and edges thereof may be covered with the firstencapsulation layer SL1 and/or the third encapsulation layer SL3 thatare made of an inorganic material.

Referring to the embodiment of FIG. 5, the slopes SLP include a firstslope SLP1 and a second slope SLP2, and are provided on a side of thedisplay area DA of the first opening OPN1. The second insulating layerINS2 is provided on the first insulating layer INS1, and covers theslopes SLP. Since the second insulating layer INS2 covers the slopes SLPof the first insulating layer INS1, metal particles deposited on theside of the first opening OPN1 do not make direct contact with theencapsulation layer SL. As a result, in this case, although the metalparticles are deposited on the side of the first opening OPN1 by avortex of etchant, the metal particles do not damage the encapsulationlayer SL. The above metal particle can be silver particle.

As shown in FIG. 5, in the case where the second insulating layer INS2covers the slopes SLP, the width of the second opening OPN2 may be lessthan that of the first opening OPN1. In an area which makes contact withthe substrate SUB, a distance W2 between the first insulating layer INS1and the second insulating layer INS2 is less than a distance W1 betweentwo parts of the first insulating layer INS1. The difference (W1−W2)between the distance W1 between the two parts of the first insulatinglayer INS1 and the distance W2 between the first insulating layer INS1and the second insulating layer INS2 may be within a range in whichmetal particles deposited on the side of the first opening OPN1 do notdamage to the encapsulating layer SL.

In the case where the slopes SLP are provided on a non-display area NDAside of the first opening OPN1, the second insulating layer INS2 that ispresent in the non-display area NDA may cover the slopes SLP.Furthermore, in the case where the slopes SLP are provided on both ofopposite sides of the first opening OPN1, the second insulating layersINS2 disposed on opposite sides of the second opening OPN2 mayrespectively cover the slopes SLP provided in the display area DA andthe slopes SLP provided in the non-display area NDA. Here, the secondinsulating layers INS2 that cover the slopes SLP may be spaced apartfrom each other by a distance in which water or oxygen do not penetratethe pixels PXL, by a residual layer of the second insulating layer INS2.

Referring to FIG. 6, the slopes SLP includes a first slope SLP1, asecond slope SLP2, a third slope SLP3, a fourth slope SLP4 and a fifthslope SLP5. Inclinations of the respective slopes SLP1, SLP2, SLP3, SLP4and SLP5 may be all different, or some of them may be the same.

The display devices described herein may be employed in variouselectronic devices. For instance, the display device may be applied to atelevision, a notebook computer, a cellular phone, a smartphone, asmartpad, a PMP (portable multimedia player), a PDA (personal digitalassistant), a navigation device, various kinds of wearable devices suchas a smartwatch, and so on.

Display device constructed according to the principles of the inventionare configured such that an encapsulation layer is prevented from beingdamaged as described above, which results in improved reliability.

Although certain exemplary embodiments and implementations have beendescribed herein, other embodiments and modifications will be apparentfrom this description. Accordingly, the inventive concepts are notlimited to such embodiments, but rather to the broader scope of thepresented claims and various obvious modifications and equivalentarrangements.

What is claimed is:
 1. A display device comprising: a substrateincluding a display area to display an image, and a non-display areaprovided on at least one side of the display area; at least one pixelprovided on the substrate; a first insulating layer provided on thesubstrate, and including a first opening at an area adjacent to thedisplay area a second insulating layer provided on the first insulatinglayer, and including a second opening at the area adjacent to thedisplay area; and an encapsulation layer covering the first opening, thesecond opening, and a portion of the non-display area, wherein the pixelcomprises a first electrode provided on the first insulating layer and asecond electrode provided on the second insulating layer, and at leastone of the first electrode and the second electrode includes a metallayer, and wherein at least one of sides of the first opening in thefirst insulating layer comprises a plurality of slopes having differentinclinations.
 2. The display device of claim 1, wherein the side of thefirst opening comprises a first slope having a first inclination, asecond slope having a second inclination different from the firstinclination, and a third slope having a third inclination different fromthe second inclination.
 3. The display device of claim 2, wherein thesecond inclination is greater than the first inclination or the thirdinclination.
 4. The display device of claim 2, wherein the secondinsulating layer covers the first slope, the second slope, and the thirdslope.
 5. The display device of claim 1, wherein the first opening andthe second opening extend along the boundary between the display areaand the non-display area of the substrate.
 6. The display device ofclaim 1, wherein the non-display area comprises one side thereof a bentarea having flexibility.
 7. The display device of claim 6, wherein thebent area is bendable at a radius of curvature of about 4.5 mm or less.8. The display device of claim 6, wherein the first insulating layer andthe second insulating layer are provided in the bent area.
 9. Thedisplay device of claim 1, wherein the non-display area is providedalong a perimeter of the display area.
 10. The display device of claim1, wherein the encapsulation layer comprises a first inorganicinsulating layer, an organic insulating layer, and a second inorganicinsulating layer that are successively stacked.
 11. The display deviceof claim 10, wherein the first inorganic insulating layer and the secondinorganic insulating layer are provided over the first opening and thesecond opening.
 12. The display device of claim 1, wherein each of thefirst insulating layer and the second insulating layer includes organicinsulating material.
 13. The display device of claim 1, wherein thesubstrate has flexibility.
 14. The display device of claim 1, whereinthe width of second opening is less than the width of the first opening,and a first distance between an edge of the first insulating layer andan edge of the second insulating layer opposite to the edge of the firstinsulating layer in the first opening is less than the width of thefirst opening.
 15. The display device of claim 14, wherein the firstdistance is within a range in which metal particles deposited on the atleast one of the sides of the first opening do not damage theencapsulating layer.
 16. A display device comprising: a substrateincluding a display area to display an image, and a non-display areaprovided on at least one side of the display area; at least one pixelprovided on the substrate; a first insulating layer provided on thesubstrate, and including a first opening at an area adjacent to thedisplay area; a second insulating layer provided on the first insulatinglayer, and including a second opening at the area adjacent to thedisplay area; and an encapsulation layer covering the first opening, thesecond opening, and a portion of the non-display area, wherein: thepixel comprises a first electrode provided on the first insulatinglayer, and a second electrode provided on the second insulating layer,and at least one of the first electrode and the second electrodeincludes a metal layer; the second insulating layer covers at least oneside of the first opening; and at least one of sides of the firstopening comprises a plurality of slopes having different inclinations.17. The display device of claim 16, wherein the second insulating layercovers a side of the first opening that is adjacent to the display area.18. A display device comprising: a substrate including a display area todisplay an image, and a non-display area provided on at least one sideof the display area; at least one pixel provided on the substrate; afirst insulating layer provided on the substrate, and including a firstopening at an area adjacent to the display area; a second insulatinglayer provided on the first insulating layer, and including a secondopening at the area adjacent to the display area; and an encapsulationlayer covering the first opening, the second opening, and a portion ofthe non-display area, wherein: the pixel comprises a first electrodeprovided on the first insulating layer, and a second electrode providedon the second insulating layer, and at least one of the first electrodeand the second electrode includes a metal layer; the second insulatinglayer covers at least one side of the first opening; and a width of thesecond opening is less than a width of the first opening, and a firstdistance between an edge of the first insulating layer and an edge ofthe second insulating layer opposite to the edge of the first insulatinglayer in the first opening is less than the width of the first opening.19. The display device of claim 18, wherein the first distance is withina range in which metal particles deposited on a side of the firstopening do not damage the encapsulating layer.